With photolithography not able to produce circuit lines much thinner than 100nm, a major focus of research into nanotechnology is in developing means to construct circuits that break the 100nm barrier ...

Extracting hydrogen from water through electrolysis offers a promising route for increasing the production of hydrogen, a clean and environmentally friendly fuel. But one major challenge of water ...

OSAKA, Japan — Mitsubishi Electric Corp. has developed a single-step, hydrofluoric acid electrochemical etching process that can achieve an aspect ratio greater than 60:1 at potentially a tenth of the ...

An example of directional etching for nanohole arrays of less than 500nm in diameter. (Image: A*STAR Institute of Materials Research and Engineering) Wet etching can be classified into two main types ...

A standard 13.56 MHz driven parallel plate reactive ion etcher (Trion Technology Minilock II), which allows internal anodization for use with chlorine was utilized for this experiment. Some features ...

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...

Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...

Ion beam expertise is critical to delivering the manufacturing tolerance required for these gratings. Oxford Instruments Plasma Technology has developed a technology to allow optical designers to ...